Show simple item record

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

dc.contributor.authorKamei, Yuya
dc.contributor.authorSano, Yohei
dc.contributor.authorYamauchi, Takashi
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorTadokoro, Masahide
dc.contributor.authorEnomoto, Masashi
dc.contributor.authorMuramatsu, Makoto
dc.contributor.authorNafus, Kathleen
dc.contributor.authorSonoda, Akihiro
dc.contributor.authorDemand, Marc
dc.contributor.authorFoubert, Philippe
dc.date.accessioned2021-10-27T11:05:45Z
dc.date.available2021-10-27T11:05:45Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33244
dc.sourceIIOimport
dc.titleNovel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorFoubert, Philippe
dc.source.peerreviewyes
dc.source.beginpage109571P
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2514930
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10957


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record