dc.contributor.author | Kamei, Yuya | |
dc.contributor.author | Sano, Yohei | |
dc.contributor.author | Yamauchi, Takashi | |
dc.contributor.author | Kawakami, Shinichiro | |
dc.contributor.author | Tadokoro, Masahide | |
dc.contributor.author | Enomoto, Masashi | |
dc.contributor.author | Muramatsu, Makoto | |
dc.contributor.author | Nafus, Kathleen | |
dc.contributor.author | Sonoda, Akihiro | |
dc.contributor.author | Demand, Marc | |
dc.contributor.author | Foubert, Philippe | |
dc.date.accessioned | 2021-10-27T11:05:45Z | |
dc.date.available | 2021-10-27T11:05:45Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33244 | |
dc.source | IIOimport | |
dc.title | Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Nafus, Kathleen | |
dc.contributor.imecauthor | Demand, Marc | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.source.peerreview | yes | |
dc.source.beginpage | 109571P | |
dc.source.conference | Extreme Ultraviolet (EUV) Lithography X | |
dc.source.conferencedate | 24/02/2019 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | https://doi.org/10.1117/12.2514930 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 10957 | |