dc.contributor.author | Kesters, Els | |
dc.contributor.author | Ohashi, Takuya | |
dc.contributor.author | Wada, Y | |
dc.contributor.author | Sugawara, M | |
dc.contributor.author | Kumagai, T | |
dc.contributor.author | Le, Quoc Toan | |
dc.contributor.author | Rip, Jens | |
dc.contributor.author | Oniki, Yusuke | |
dc.contributor.author | Holsteyns, Frank | |
dc.date.accessioned | 2021-10-27T11:16:59Z | |
dc.date.available | 2021-10-27T11:16:59Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33269 | |
dc.source | IIOimport | |
dc.title | Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Kesters, Els | |
dc.contributor.imecauthor | Ohashi, Takuya | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.imecauthor | Rip, Jens | |
dc.contributor.imecauthor | Oniki, Yusuke | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.contributor.orcidimec | Oniki, Yusuke::0000-0002-6619-1327 | |
dc.source.peerreview | no | |
dc.source.conference | The Surface Preparation and Cleaning Conference (SPCC) 2019 | |
dc.source.conferencedate | 1/04/2019 | |
dc.source.conferencelocation | Portland, OR USA | |
imec.availability | Published - imec | |