Authors

Kikuchi, Yoshiaki; Hopf, Toby; Mannaert, Geert; Everaert, Jean-Luc; Kubicek, Stefan; Eyben, Pierre; Waite, Andrew; Borniquel, Jose; Variam, Naushad; Mocuta, Dan; Horiguchi, Naoto

ISSN

0038-1101

Journal

Solid-State Electronics

Volume

152

Title

Improvement in drain-induced-barrier-lowering and on-state current characteristics of bulk Si fin field-effect-transistors using high temperature phosphorus extension ion implantation

Publication type

Journal article