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The importance of H2O2 decomposition in silicon surface cleaning

dc.contributor.authorSchmidt, Harald
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorHeyns, Marc
dc.contributor.authorHurd, Trace
dc.contributor.authorHatcher, Z.
dc.date.accessioned2021-09-29T12:46:49Z
dc.date.available2021-09-29T12:46:49Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/332
dc.sourceIIOimport
dc.titleThe importance of H2O2 decomposition in silicon surface cleaning
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage419
dc.source.endpage421
dc.source.conferenceExtended Abstracts of the International Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate23/08/1994
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access


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