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Critical pattern behavior at nanometer scale vicinity of black border

dc.contributor.authorKovalevich, Tatiana
dc.contributor.authorBekaert, Joost
dc.contributor.authorWiaux, Vincent
dc.contributor.authorLiddle, Jack
dc.contributor.authorDavydova, Natalia
dc.contributor.authorTien, Ming-Chun
dc.date.accessioned2021-10-27T11:44:00Z
dc.date.available2021-10-27T11:44:00Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33326
dc.sourceIIOimport
dc.titleCritical pattern behavior at nanometer scale vicinity of black border
dc.typeOral presentation
dc.contributor.imecauthorKovalevich, Tatiana
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorLiddle, Jack
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewno
dc.source.conference17th Fraunhofer IISB Lithography Simulation Workshop
dc.source.conferencedate26/09/2019
dc.source.conferencelocationBehringersmuhle Germany
imec.availabilityPublished - imec


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