Authors

Lorusso, Gian; Rispens, Gijsbert; Rutigliani, Vito; Van Roey, Frieda; Frommhold, Andreas; Schiffelers, Guido

Conference

Metrology, Inspection, and Process Control for Microlithography XXXIII

Title

Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions

Publication type

Meeting abstract