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The refined EUVL mask model

dc.contributor.authorMakhotkin, Igor
dc.contributor.authorWu, Meiyi
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorScholze, Frank
dc.date.accessioned2021-10-27T13:19:27Z
dc.date.available2021-10-27T13:19:27Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33515
dc.sourceIIOimport
dc.titleThe refined EUVL mask model
dc.typeProceedings paper
dc.contributor.imecauthorMakhotkin, Igor
dc.contributor.imecauthorWu, Meiyi
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conference313 PTB Seminar "VUV- and EUV Metrology"
dc.source.conferencedate22/10/2019
dc.source.conferencelocationBerlin Germany
imec.availabilityPublished - imec


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