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Evaluation of ozonated water spray for resist cleaning applications

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLux, Marcel
dc.contributor.authorClaes, Martine
dc.contributor.authorJassal, A. S.
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorBergman, E.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-06T10:54:50Z
dc.date.available2021-10-06T10:54:50Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3353
dc.sourceIIOimport
dc.titleEvaluation of ozonated water spray for resist cleaning applications
dc.typeMeeting abstract
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1116
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 99-2


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