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Impact of local variability on defect-aware process windows

dc.contributor.authorMaslow, Mark John
dc.contributor.authorYaegashi, Hidetami
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorWahlisch, Felix
dc.contributor.authorRispens, Gijsbert
dc.contributor.authorSlachter, Bram
dc.contributor.authorYoshida, Keisuke
dc.contributor.authorHara, Arisa
dc.contributor.authorOikawa, Noriaki
dc.contributor.authorPathak, Abhinav
dc.contributor.authorCerbu, Dorin
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-27T13:42:00Z
dc.date.available2021-10-27T13:42:00Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33556
dc.sourceIIOimport
dc.titleImpact of local variability on defect-aware process windows
dc.typeProceedings paper
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.imecauthorYoshida, Keisuke
dc.contributor.imecauthorOikawa, Noriaki
dc.contributor.imecauthorPathak, Abhinav
dc.contributor.imecauthorCerbu, Dorin
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.source.peerreviewyes
dc.source.beginpage109570H
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2514719
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10957


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