dc.contributor.author | Mouraille, Orion | |
dc.contributor.author | van Haren, Richard | |
dc.contributor.author | Steinert, Steffen | |
dc.contributor.author | D'have, Koen | |
dc.contributor.author | Van Dijk, Leon | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Beyer, Dirk | |
dc.date.accessioned | 2021-10-27T14:23:38Z | |
dc.date.available | 2021-10-27T14:23:38Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33629 | |
dc.source | IIOimport | |
dc.title | The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | van Haren, Richard | |
dc.contributor.imecauthor | D'have, Koen | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.source.peerreview | no | |
dc.source.conference | ASML Technology Conference 2019 's Hertogenbosch | |
dc.source.conferencedate | 20/06/2019 | |
dc.source.conferencelocation | 's Hertogenbosch The Netherlands | |
imec.availability | Published - imec | |