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Localized power spectral density analysis on atomic force microscopy images for advanced patterning applications

dc.contributor.authorMoussa, Alain
dc.contributor.authorSaib, Mohamed
dc.contributor.authorPaolillo, Sara
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorIlliberi, Andrea
dc.contributor.authorMaes, Jan
dc.contributor.authorDeng, Shaoren
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-27T14:24:17Z
dc.date.available2021-10-27T14:24:17Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33630
dc.sourceIIOimport
dc.titleLocalized power spectral density analysis on atomic force microscopy images for advanced patterning applications
dc.typeProceedings paper
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorIlliberi, Andrea
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDeng, Shaoren
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage109591O
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIII
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2515178
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10959


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