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Study on La2O3 wet clean by pH controlled functional water

dc.contributor.authorOgawa, Yuichi
dc.contributor.authorIino, Hideaki
dc.contributor.authorFukui, Takeo
dc.contributor.authorOniki, Yusuke
dc.contributor.authorAkanishi, Yuya
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-27T14:58:10Z
dc.date.available2021-10-27T14:58:10Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33688
dc.sourceIIOimport
dc.titleStudy on La2O3 wet clean by pH controlled functional water
dc.typeProceedings paper
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage21
dc.source.endpage26
dc.source.conference16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16)
dc.source.conferencedate13/10/2019
dc.source.conferencelocationAtlanta, GA USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/92/2/21
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 92(2019), issue 2


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