dc.contributor.author | Oniki, Yusuke | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Holsteyns, Frank | |
dc.date.accessioned | 2021-10-27T15:02:42Z | |
dc.date.available | 2021-10-27T15:02:42Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33696 | |
dc.source | IIOimport | |
dc.title | Selective etches for gate-all-around (GAA) device integration: opportunities and challenges | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Oniki, Yusuke | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.orcidimec | Oniki, Yusuke::0000-0002-6619-1327 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1092 | |
dc.source.conference | 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16) | |
dc.source.conferencedate | 13/10/2019 | |
dc.source.conferencelocation | Atlanta, GA USA | |
dc.identifier.url | http://ma.ecsdl.org/content/MA2019-02/23/1092.abstract | |
imec.availability | Published - imec | |
imec.internalnotes | ECS Meeting Abstracts; Vol. MA2019-02 | |