dc.contributor.author | Oniki, Yusuke | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Holsteyns, Frank | |
dc.date.accessioned | 2021-10-27T15:03:16Z | |
dc.date.available | 2021-10-27T15:03:16Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33697 | |
dc.source | IIOimport | |
dc.title | Selective etches for gate-all-around (GAA) device integration: opportunities and challenges | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Oniki, Yusuke | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.orcidimec | Oniki, Yusuke::0000-0002-6619-1327 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 3 | |
dc.source.endpage | 12 | |
dc.source.conference | 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16) | |
dc.source.conferencedate | 13/10/2019 | |
dc.source.conferencelocation | Atlanta, GA USA | |
dc.identifier.url | http://ecst.ecsdl.org/content/92/2/3.abstract | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 92(2019), Issue 2 | |