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Mask absorber development to enable next-generation EUVL

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorOpsomer, Karl
dc.contributor.authorSouriau, Laurent
dc.contributor.authorRip, Jens
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorLaubis, Christian
dc.contributor.authorHoenicke, Philipp
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-27T16:01:47Z
dc.date.available2021-10-27T16:01:47Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33794
dc.sourceIIOimport
dc.titleMask absorber development to enable next-generation EUVL
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.source.peerreviewyes
dc.source.beginpage111780F
dc.source.conferencePhotomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
dc.source.conferencedate23/04/2019
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttps://doi.org/10.1117/12.2537967
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11178


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