dc.contributor.author | Porret, Clément | |
dc.contributor.author | Huang, Yan-Hua | |
dc.contributor.author | Rengo, Gianluca | |
dc.contributor.author | Yu, Hao | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Everaert, Jean-Luc | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Vohra, Anurag | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Langer, Robert | |
dc.contributor.author | Loo, Roger | |
dc.date.accessioned | 2021-10-27T16:17:58Z | |
dc.date.available | 2021-10-27T16:17:58Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33819 | |
dc.source | IIOimport | |
dc.title | Selective epitaxial p-SiGe source-drain contacts: low contact resistivity (1.5x10-9 ohm.cm2) by optimizing strain and doping concentration | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Porret, Clément | |
dc.contributor.imecauthor | Rengo, Gianluca | |
dc.contributor.imecauthor | Yu, Hao | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Everaert, Jean-Luc | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.imecauthor | Vohra, Anurag | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Langer, Robert | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.orcidimec | Porret, Clément::0000-0002-4561-348X | |
dc.contributor.orcidimec | Yu, Hao::0000-0002-1976-0259 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.contributor.orcidimec | Vohra, Anurag::0000-0002-2831-0719 | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Langer, Robert::0000-0002-1132-3468 | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 601 | |
dc.source.endpage | 602 | |
dc.source.conference | Extended Abstracts of the 2019 International Conference on Solid State Devices and Materials - SSDM | |
dc.source.conferencedate | 2/09/2019 | |
dc.source.conferencelocation | Nagoya Japan | |
dc.identifier.url | http://www.ssdm.jp/docs/SSDM2019_TechnicalProgram-All_Sep3-5.pdf?rev=20190827 | |
imec.availability | Published - imec | |