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Capablities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution

dc.contributor.authorDe Witte, Hilde
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDouglas, M.
dc.contributor.authorConard, Thierry
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorGijbels, Renaat
dc.date.accessioned2021-10-06T10:59:08Z
dc.date.available2021-10-06T10:59:08Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3384
dc.sourceIIOimport
dc.titleCapablities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage147
dc.source.endpage159
dc.source.conferenceAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
dc.source.conferencedate16/09/1999
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-16


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