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Scatterometry and AFM measurement combination for area selective deposition process characterization

dc.contributor.authorSaib, Mohamed
dc.contributor.authorMoussa, Alain
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorHung, Joey
dc.contributor.authorKoret, Roy
dc.contributor.authorTurovets, Igor
dc.contributor.authorGer, Avron
dc.contributor.authorDeng, Shaoren
dc.contributor.authorIlliberi, Andrea
dc.contributor.authorMaes, Jan Willem
dc.contributor.authorWoodworth, Gabriel
dc.contributor.authorStrauss, Michael
dc.date.accessioned2021-10-27T17:27:22Z
dc.date.available2021-10-27T17:27:22Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33926
dc.sourceIIOimport
dc.titleScatterometry and AFM measurement combination for area selective deposition process characterization
dc.typeProceedings paper
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHung, Joey
dc.contributor.imecauthorDeng, Shaoren
dc.contributor.imecauthorIlliberi, Andrea
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage109591N
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIII
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2515177
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10959


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