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Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers

dc.contributor.authorSejpal, Rajiv
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorArmeanu, Ana
dc.contributor.authorWei, Chi-I
dc.contributor.authorGillijns, Werner
dc.contributor.authorLafferty, Neal
dc.contributor.authorFenger, Germain
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-27T17:49:55Z
dc.date.available2021-10-27T17:49:55Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33961
dc.sourceIIOimport
dc.titleExploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage111481B
dc.source.conferencePhotomask Technology 2019
dc.source.conferencedate16/09/2019
dc.source.conferencelocationMonterey USA
dc.identifier.urlhttps://doi.org/10.1117/12.2536892
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 11148


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