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Development of main chain scission type photoresists for EUV lithography

dc.contributor.authorShirotori, Akihide
dc.contributor.authorVesters, Yannick
dc.contributor.authorHoshino, Manabu
dc.contributor.authorRathore, Ashish
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMatsumoto, Hirokazu
dc.date.accessioned2021-10-27T18:16:44Z
dc.date.available2021-10-27T18:16:44Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34001
dc.sourceIIOimport
dc.titleDevelopment of main chain scission type photoresists for EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorRathore, Ashish
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage111470J
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography 2019
dc.source.conferencedate15/09/2019
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2536348
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.11147


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