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Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?
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Authors
Simoen, Eddy
;
O'Sullivan, Barry
;
Ritzenthaler, Romain
;
Dentoni Litta, Eugenio
;
Schram, Tom
;
Horiguchi, Naoto
;
Claeys, Cor
ISSN
0268-1242
Issue
1
Journal
Semiconductor Science and Technology
Volume
34
Title
Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?
Publication type
Journal article
Embargo date
9999-12-31
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