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Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?
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2008 since deposited on 2021-10-27
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Acq. date: 2026-01-07
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2008 since deposited on 2021-10-27
1last month
1last week
Acq. date: 2026-01-07
Citations