dc.contributor.author | Soethoudt, Job | |
dc.contributor.author | Grillo, Fabio | |
dc.contributor.author | Marques, Esteban | |
dc.contributor.author | Van Ommen, Ruud | |
dc.contributor.author | Briggs, Basoene | |
dc.contributor.author | Hody, Hubert | |
dc.contributor.author | Spampinato, Valentina | |
dc.contributor.author | Franquet, Alexis | |
dc.contributor.author | Chan, BT | |
dc.contributor.author | Delabie, Annelies | |
dc.date.accessioned | 2021-10-27T18:43:24Z | |
dc.date.available | 2021-10-27T18:43:24Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34040 | |
dc.source | IIOimport | |
dc.title | Defect mitigation solution for area-selective ALD of Ru on TiN/SiO2 nanopatterns | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Soethoudt, Job | |
dc.contributor.imecauthor | Marques, Esteban | |
dc.contributor.imecauthor | Briggs, Basoene | |
dc.contributor.imecauthor | Hody, Hubert | |
dc.contributor.imecauthor | Spampinato, Valentina | |
dc.contributor.imecauthor | Franquet, Alexis | |
dc.contributor.imecauthor | Chan, BT | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.orcidimec | Spampinato, Valentina::0000-0003-3225-6740 | |
dc.contributor.orcidimec | Franquet, Alexis::0000-0002-7371-8852 | |
dc.contributor.orcidimec | Chan, BT::0000-0003-2890-0388 | |
dc.source.peerreview | no | |
dc.source.conference | ALD 2019 | |
dc.source.conferencedate | 21/07/2019 | |
dc.source.conferencelocation | Bellevue USA | |
imec.availability | Published - imec | |