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Thin photoresist layers for microelectronic devices: a comparative study between ToF and Orbitrap™ mass analyzers.

dc.contributor.authorSpampinato, Valentina
dc.contributor.authorFranquet, Alexis
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPollentier, Ivan
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorPirkl, Alexander
dc.contributor.authorKayser, Sven
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorvan der Heide, Paul
dc.date.accessioned2021-10-27T18:54:16Z
dc.date.available2021-10-27T18:54:16Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34056
dc.sourceIIOimport
dc.titleThin photoresist layers for microelectronic devices: a comparative study between ToF and Orbitrap™ mass analyzers.
dc.typeOral presentation
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.source.peerreviewno
dc.source.conferenceSIMS 22
dc.source.conferencedate20/10/2019
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - imec


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