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FEOL patterning challenges in scaled SRAM with vertical Surrounding Gate Transistors (SGT)

dc.contributor.authorTao, Zheng
dc.contributor.authorLi, Waikin
dc.contributor.authorKim, Min-Soo
dc.contributor.authorDevriendt, Katia
dc.contributor.authorLorant, Christophe
dc.contributor.authorSebaai, Farid
dc.contributor.authorPorret, Clément
dc.contributor.authorRosseel, Erik
dc.contributor.authorSepulveda Marquez, Alfonso
dc.contributor.authorJourdan, Nicolas
dc.contributor.authorKikuchi, Yoshiaki
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorMitard, Jerome
dc.contributor.authorMatagne, Philippe
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorDangol, Anish
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorMartinez Alanis, Gerardo Tadeo
dc.contributor.authorGeypen, Jef
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorLee, James
dc.contributor.authorLi, YiSuo
dc.contributor.authorKanazawa, Kenichi
dc.contributor.authorHarada, Nozomu
dc.contributor.authorMasuoka, Fujio
dc.date.accessioned2021-10-27T19:30:08Z
dc.date.available2021-10-27T19:30:08Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34109
dc.sourceIIOimport
dc.titleFEOL patterning challenges in scaled SRAM with vertical Surrounding Gate Transistors (SGT)
dc.typeMeeting abstract
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorSepulveda Marquez, Alfonso
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorKikuchi, Yoshiaki
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorDangol, Anish
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorMartinez Alanis, Gerardo Tadeo
dc.contributor.imecauthorGeypen, Jef
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecSepulveda Marquez, Alfonso::0000-0003-4726-177X
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecMartinez Alanis, Gerardo Tadeo::0000-0001-5036-0491
dc.source.peerreviewyes
dc.source.conferenceDPS2019 (41st International symposium on Dry Process)
dc.source.conferencedate21/11/2019
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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