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Ru CMP for advanced metallization

dc.contributor.authorTeugels, Lieve
dc.contributor.authorHeylen, Nancy
dc.contributor.authorRidremont, Romain
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorYamanaka, Tatsuya
dc.contributor.authorYamada, Yuuya
dc.contributor.authorNishimura, Kouhei
dc.contributor.authorBuch, Xavier
dc.contributor.authorHiro, Akito
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-27T19:32:56Z
dc.date.available2021-10-27T19:32:56Z
dc.date.issued2019-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34113
dc.sourceIIOimport
dc.titleRu CMP for advanced metallization
dc.typeProceedings paper
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorRidremont, Romain
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorHiro, Akito
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Planarization/CMP Technology 2019
dc.source.conferencedate15/09/2019
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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