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Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

dc.contributor.authorVaenkatesan, Vidya
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorKooiman, Marleen
dc.contributor.authorKubis, Michael
dc.contributor.authorVan Look, Lieve
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorGallagher, Emily
dc.contributor.authorNam, DS
dc.contributor.authorMulkens, Jan
dc.contributor.authorFinders, Jo
dc.contributor.authorRispens, Gijsbert
dc.date.accessioned2021-10-27T20:09:58Z
dc.date.available2021-10-27T20:09:58Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34167
dc.sourceIIOimport
dc.titleEvaluation of local CD and placement distribution on EUV mask and its impact on wafer
dc.typeProceedings paper
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.identifier.doi10.1117/12.2538243
dc.source.peerreviewyes
dc.source.beginpage1117807-1
dc.source.endpage1117807-7
dc.source.conferenceXXVI Symposium on Photomask and Next-Generation Lithography Mask Technology 2019
dc.source.conferencedate16/04/2019
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11178


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