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A new concept to qualify pattern shift on EUV scanners

dc.contributor.authorVan den berg, Pim
dc.contributor.authorVan Look, Lieve
dc.contributor.authorVan Swaaij, Gijs
dc.contributor.authorVan Rhee, Tasja
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorGielis, Joost
dc.date.accessioned2021-10-27T20:27:35Z
dc.date.available2021-10-27T20:27:35Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34192
dc.sourceIIOimport
dc.titleA new concept to qualify pattern shift on EUV scanners
dc.typeOral presentation
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorSchiffelers, Guido
dc.source.peerreviewno
dc.source.conference35th European Mask and Lithography Conference EMLC 2019
dc.source.conferencedate17/06/2019
dc.source.conferencelocationDresden Germany
dc.identifier.urlhttps://www.vde.com/resource/blob/1872556/5ace29db71f7514c625d5e65bd659247/program-schedule-emlc2019-data.pdf
imec.availabilityPublished - imec
imec.internalnotesP-3


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