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Dynamics of electromigration induced void-hillock growth and precipitation/dissolution of addition elements studied by in-situ electron microscopy resistance measurements
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Dynamics of electromigration induced void-hillock growth and precipitation/dissolution of addition elements studied by in-situ electron microscopy resistance measurements
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Date
1999
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
D'Haen, Jan
;
Cosemans, P.
;
Manca, Jean
;
Lekens, Geert
;
Martens, T.
;
De Ceuninck, Ward
;
D'Olieslaeger, Marc
;
De Schepper, Luc
;
Maex, Karen
Journal
Microelectronics and Reliability
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1983
since deposited on 2021-10-06
Acq. date: 2025-12-12
Citations
Metrics
Views
1983
since deposited on 2021-10-06
Acq. date: 2025-12-12
Citations