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Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

dc.contributor.authorVandenbroucke, Sofie
dc.contributor.authorLevrau, Elisabeth
dc.contributor.authorMinjauw, Matthias
dc.contributor.authorSolano Minuesa, Eduardo
dc.contributor.authorVan de Kerckhove, Kevin
dc.contributor.authorDevloo-Casier, Kilian
dc.contributor.authorPulinthanathu Sree, Sreeprasant
dc.contributor.authorMartens, Johan A.
dc.contributor.authorVos, Rita
dc.contributor.authorJans, Karolien
dc.contributor.authorDendooven, Jolien
dc.contributor.authorVereecken, Philippe
dc.contributor.authorStakenborg, Tim
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-27T21:37:20Z
dc.date.available2021-10-27T21:37:20Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34291
dc.sourceIIOimport
dc.titleSurface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium
dc.typeMeeting abstract
dc.contributor.imecauthorVandenbroucke, Sofie
dc.contributor.imecauthorLevrau, Elisabeth
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorJans, Karolien
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.orcidimecVandenbroucke, Sofie::0000-0002-2831-3696
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.source.peerreviewno
dc.source.conferenceEuroCVD 22 - Baltic ALD 16
dc.source.conferencedate24/06/2019
dc.source.conferencelocationLuxembourg Luxembourg
dc.identifier.urlhttp://hdl.handle.net/1854/LU-8625841
imec.availabilityPublished - imec


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