Authors

Veloso, Anabela; Simoen, Eddy; Oliveira, Alberto; Vaisman Chasin, Adrian; Chen, S.-C.; Lin, Y.; Miyashita, T.; Kim, M.; Jang, Doyoung; Ritzenthaler, Romain; Zhou, Daisy; Mertens, Hans; Pena, Vanessa; Santoro, Gaetano; Kenis, Karine; Sebaai, Farid; Mannaert, Geert; Devriendt, Katia; Hopf, Toby; Versluijs, Janko; Richard, Olivier; Machillot, Jerome; Yoshida, Naomi; Horiguchi, Naoto

Conference

2019 International Conference on Solid State Devices and Materials (SSDM 2019)

Title

Scaled, novel effective workfunction metal gate stacks for advanced Low-VT, gate-all-around vertically stacked nanosheet FETs with reduced vertical distance between sheets

Publication type

Proceedings paper

Embargo date

9999-12-31