dc.contributor.author | Wostyn, Kurt | |
dc.contributor.author | Ragnarsson, Lars-Ake | |
dc.contributor.author | Arimura, Hiroaki | |
dc.contributor.author | Vaisman Chasin, Adrian | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Rondas, Dirk | |
dc.contributor.author | Loo, Roger | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2021-10-27T23:36:39Z | |
dc.date.available | 2021-10-27T23:36:39Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34450 | |
dc.source | IIOimport | |
dc.title | Impact of Ge-oxide-scavenging on low-T steam oxidation and passivation of bi-axially strained Si0.75Ge0.25 | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Wostyn, Kurt | |
dc.contributor.imecauthor | Ragnarsson, Lars-Ake | |
dc.contributor.imecauthor | Arimura, Hiroaki | |
dc.contributor.imecauthor | Vaisman Chasin, Adrian | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Rondas, Dirk | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
dc.contributor.orcidimec | Ragnarsson, Lars-Ake::0000-0003-1057-8140 | |
dc.contributor.orcidimec | Vaisman Chasin, Adrian::0000-0002-9940-0260 | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 114 | |
dc.source.endpage | 115 | |
dc.source.conference | International Si Technology and Device Meeting / Int. Conf. on Si epitaxy and Heterostructures - 2nd Joint ISTDM / ICSI 2019 Con | |
dc.source.conferencedate | 2/06/2019 | |
dc.source.conferencelocation | Madison, WI USA | |
imec.availability | Published - imec | |