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Role of defects in the reliability of HfO2/Si-based spacer dielectric stacks for local interconnects

dc.contributor.authorWu, Chen
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorPadovani, Andrea
dc.contributor.authorLesniewska, Alicja
dc.contributor.authorDemuynck, Steven
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-27T23:38:56Z
dc.date.available2021-10-27T23:38:56Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34453
dc.sourceIIOimport
dc.titleRole of defects in the reliability of HfO2/Si-based spacer dielectric stacks for local interconnects
dc.typeProceedings paper
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorLesniewska, Alicja
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecLesniewska, Alicja::0000-0003-3863-065X
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage6
dc.source.conferenceIEEE International Reliability Physics Symposium - IRPS
dc.source.conferencedate31/03/2019
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8720534
imec.availabilityPublished - open access


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