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Lifetime test on EUV photomask with EBL2

dc.contributor.authorWu, Chien-ching
dc.contributor.authorBender, Markus
dc.contributor.authorJonckheere, Rik
dc.contributor.authorScholze, Frank
dc.contributor.authorBekman, Herman
dc.contributor.authorvan Putten, Michel
dc.contributor.authorde Zanger, Rory
dc.contributor.authorEbeling, Rob
dc.contributor.authorWesterhout, Jeroen
dc.contributor.authorNicolai, Kyri
dc.contributor.authorvan Veldhoven, Jacqueline
dc.contributor.authorde Rooij-Lohmann, Veronique
dc.contributor.authorKievit, Olaf
dc.contributor.authorDeutz, Alex
dc.date.accessioned2021-10-27T23:40:37Z
dc.date.available2021-10-27T23:40:37Z
dc.date.issued2019-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34455
dc.sourceIIOimport
dc.titleLifetime test on EUV photomask with EBL2
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewyes
dc.source.beginpage111780E
dc.source.conferencePhotomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
dc.source.conferencedate16/04/2019
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttps://doi.org/10.1117/12.2537734
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11178


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