Optimization of an advanced positive DUV photoresist towards 150 nm and beyond

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Authors
Ercken, Monique; Moelants, Myriam; Vandenberghe, Geert; Goethals, Mieke; Ronse, Kurt; Masuda, Seiya; Spiess, Walter; Pawlowski, G.
Conference
MNE'99 - Micro and Nano Engineering Conference
Title
Optimization of an advanced positive DUV photoresist towards 150 nm and beyond
Publication type
Oral presentation
Embargo date
9999-12-31
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