Show simple item record

Optimization of an advanced positive DUV photoresist towards 150 nm and beyond

dc.contributor.authorErcken, Monique
dc.contributor.authorMoelants, Myriam
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorMasuda, Seiya
dc.contributor.authorSpiess, Walter
dc.contributor.authorPawlowski, G.
dc.date.accessioned2021-10-06T11:09:41Z
dc.date.available2021-10-06T11:09:41Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3450
dc.sourceIIOimport
dc.titleOptimization of an advanced positive DUV photoresist towards 150 nm and beyond
dc.typeOral presentation
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorMoelants, Myriam
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceMNE'99 - Micro and Nano Engineering Conference
dc.source.conferencedate21/09/1999
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
3412.pdf
Size:
808.7Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record