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Challenges and approaches in advanced Fin patterning

dc.contributor.authorZhang, Liping
dc.contributor.authorHellin, David
dc.contributor.authorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-28T00:44:39Z
dc.date.available2021-10-28T00:44:39Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34538
dc.sourceIIOimport
dc.titleChallenges and approaches in advanced Fin patterning
dc.typeProceedings paper
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.source.peerreviewyes
dc.source.conferencePESM-2019 Plasma Etch and Strip in Microelectronics
dc.source.conferencedate20/05/2019
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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