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Self-assembled monolayers as ALD Ru growth inhibitor in an area-selective bottom-up metallization scheme

dc.contributor.authorZyulkov, Ivan
dc.contributor.authorMadhiwala, Viraj
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-28T01:00:16Z
dc.date.available2021-10-28T01:00:16Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34559
dc.sourceIIOimport
dc.titleSelf-assembled monolayers as ALD Ru growth inhibitor in an area-selective bottom-up metallization scheme
dc.typeMeeting abstract
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewno
dc.source.conferenceASD workshop
dc.source.conferencedate4/04/2019
dc.source.conferencelocationleuven belgium
imec.availabilityPublished - imec


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