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Si-cap-free low-DIT SiGe gate stack for high-performance pFETs

dc.contributor.authorArimura, Hiroaki
dc.contributor.authorWostyn, Kurt
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorConard, Thierry
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorFranco, Jacopo
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-28T20:10:42Z
dc.date.available2021-10-28T20:10:42Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34642
dc.sourceIIOimport
dc.titleSi-cap-free low-DIT SiGe gate stack for high-performance pFETs
dc.typeMeeting abstract
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpageG03-1751
dc.source.conferenceECS 2020 Fall Meeting Symposium G03: SiGe, Ge & Related Compounds: Materials, Processing and Devices
dc.source.conferencedate4/10/2020
dc.source.conferencelocationHonolulu (online) USA
dc.identifier.urlhttps://ecs.confex.com/ecs/prime2020/meetingapp.cgi/Paper/142831
imec.availabilityPublished - imec


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