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Impact of dummy metal structures on post oxide CMP planarization

dc.contributor.authorGillot, Christophe
dc.contributor.authorDe Backer, E.
dc.contributor.authorGrillaert, Joost
dc.contributor.authorHeylen, Nancy
dc.contributor.authorVaca, L. M.
dc.contributor.authorBlavier, G.
dc.date.accessioned2021-10-06T11:12:23Z
dc.date.available2021-10-06T11:12:23Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3465
dc.sourceIIOimport
dc.titleImpact of dummy metal structures on post oxide CMP planarization
dc.typeProceedings paper
dc.contributor.imecauthorHeylen, Nancy
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage413
dc.source.endpage416
dc.source.conference4th International Chemical Mechanical Planarization for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencedate11/02/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access


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