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Chemistry of the silicon oxide surface: adsorption from SC1 solutions

dc.contributor.authorHall, L.
dc.contributor.authorSees, J.
dc.contributor.authorHurd, Trace
dc.contributor.authorSchmidt, B.
dc.contributor.authorBellay, L.
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-06T11:16:14Z
dc.date.available2021-10-06T11:16:14Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3486
dc.sourceIIOimport
dc.titleChemistry of the silicon oxide surface: adsorption from SC1 solutions
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage53
dc.source.endpage58
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vols. 65-66


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