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300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns

dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorDelabie, Annelies
dc.contributor.authorHung, Joey
dc.contributor.authorWarad, L.
dc.contributor.authorShah, Kavita
dc.date.accessioned2021-10-28T20:46:50Z
dc.date.available2021-10-28T20:46:50Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34916
dc.sourceIIOimport
dc.title300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns
dc.typeMeeting abstract
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHung, Joey
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageAS-TuP-14
dc.source.conference20th International Conference on Atomic Layer Deposition
dc.source.conferencedate2/04/2020
dc.source.conferencelocationPalo Alto, CA USA
dc.identifier.urlhttps://www.avssymposium.org/ALD2020/Meetings/Schedule
imec.availabilityPublished - open access


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