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Kinetic modeling of Ru area-selective atomic layer deposition in nanopatterns

dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorMarques, Esteban
dc.contributor.authorSoethoudt, Job
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-28T20:47:01Z
dc.date.available2021-10-28T20:47:01Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34917
dc.sourceIIOimport
dc.titleKinetic modeling of Ru area-selective atomic layer deposition in nanopatterns
dc.typeMeeting abstract
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorMarques, Esteban
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.source.peerreviewno
dc.source.conferenceAVS Atomic Layer Deposition Conference
dc.source.conferencedate28/06/2020
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - imec


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