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Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon
Publication:
Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon
Date
1994
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bender, Hugo
;
Li, Li
;
Mertens, Paul
;
Caymax, Matty
;
Heyns, Marc
Journal
Abstract
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33308
since deposited on 2021-09-29
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Acq. date: 2025-10-25
Citations
Metrics
Views
33308
since deposited on 2021-09-29
434
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations