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Defectivity modulation in EUV resists through advanced filtration technologies

dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorUmeda, T.
dc.contributor.authorMizuno, T.
dc.contributor.authorHattori, A.
dc.contributor.authorVaranasi, R.
dc.contributor.authorSingh, A.
dc.contributor.authorBeera, R.
dc.contributor.authorFoubert, Philippe
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorDrent, Waut
dc.date.accessioned2021-10-28T21:28:06Z
dc.date.available2021-10-28T21:28:06Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35080
dc.sourceIIOimport
dc.titleDefectivity modulation in EUV resists through advanced filtration technologies
dc.typeProceedings paper
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorDrent, Waut
dc.source.peerreviewyes
dc.source.beginpage113260K
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2560144
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11326


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