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Technology and reliability aspects of ultra-thin silicon dioxide layers

dc.contributor.authorHeyns, Marc
dc.contributor.authorNigam, Tanya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorMertens, Paul
dc.contributor.authorSchaekers, Marc
dc.contributor.authorBearda, Twan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.contributor.authorClaes, Martine
dc.contributor.authorHoussa, Michel
dc.contributor.authorVandewalle, N.
dc.contributor.authorAusloos, M.
dc.date.accessioned2021-10-06T11:21:09Z
dc.date.available2021-10-06T11:21:09Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3511
dc.sourceIIOimport
dc.titleTechnology and reliability aspects of ultra-thin silicon dioxide layers
dc.typeOral presentation
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorHoussa, Michel
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Surface Science for Micro- and Nano-Device Fabrication - ISSS-3
dc.source.conferencedate29/11/1999
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - open access


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