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Technology and reliability of sub-3nm oxides

dc.contributor.authorHeyns, Marc
dc.contributor.authorNigam, Tanya
dc.contributor.authorDegraeve, Robin
dc.contributor.authorMertens, Paul
dc.contributor.authorSchaekers, Marc
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.contributor.authorHoussa, Michel
dc.contributor.authorVandewalle, N.
dc.contributor.authorAusloos, M.
dc.date.accessioned2021-10-06T11:21:23Z
dc.date.available2021-10-06T11:21:23Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3512
dc.sourceIIOimport
dc.titleTechnology and reliability of sub-3nm oxides
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHoussa, Michel
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1
dc.source.endpage7
dc.source.conference4th Symposium on Thin Gate Oxides
dc.source.conferencedate22/01/1999
dc.source.conferencelocationGotemba Japan
imec.availabilityPublished - open access


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