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The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography

dc.contributor.authorHumphris, Andrew
dc.contributor.authorMoussa, Alain
dc.contributor.authorDusa, Mircea
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorNewman, Ellis
dc.contributor.authorGoulden, Jenny
dc.contributor.authorFeng, Lei
dc.contributor.authorBevis, Christopher
dc.date.accessioned2021-10-28T22:40:46Z
dc.date.available2021-10-28T22:40:46Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35291
dc.sourceIIOimport
dc.titleThe application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorCharley, Anne-Laure
dc.source.peerreviewyes
dc.source.beginpage113251M
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2552054
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11325


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