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Stochastic printing behavior of non-local mask deficiencies in EUV lithography

dc.contributor.authorJonckheere, Rik
dc.contributor.authorMelvin III, Lawrence
dc.date.accessioned2021-10-28T22:59:15Z
dc.date.available2021-10-28T22:59:15Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35338
dc.sourceIIOimport
dc.titleStochastic printing behavior of non-local mask deficiencies in EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewyes
dc.source.beginpage1151710
dc.source.conferenceExtreme Ultraviolet Lithography 2020
dc.source.conferencedate21/09/2020
dc.source.conferencelocationon-line USA
dc.identifier.urlhttps://doi.org/10.1117/12.2572998
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11517


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