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300mm wafer level WS2 p-MOS capacitor characterization, smulation, and analysis

dc.contributor.authorKoladi Mootheri, Vivek
dc.contributor.authorOkuyama, Atsushi
dc.contributor.authorSmets, Quentin
dc.contributor.authorSchram, Tom
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.contributor.authorLin, Dennis
dc.date.accessioned2021-10-28T23:26:33Z
dc.date.available2021-10-28T23:26:33Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35404
dc.sourceIIOimport
dc.title300mm wafer level WS2 p-MOS capacitor characterization, smulation, and analysis
dc.typeMeeting abstract
dc.contributor.imecauthorKoladi Mootheri, Vivek
dc.contributor.imecauthorOkuyama, Atsushi
dc.contributor.imecauthorSmets, Quentin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorLin, Dennis
dc.contributor.orcidimecKoladi Mootheri, Vivek::0000-0002-1373-8405
dc.contributor.orcidimecSmets, Quentin::0000-0002-2356-5915
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.beginpage5.2
dc.source.conference51st IEEE Semiconductor Interface Specialist Conference - SISC 2020
dc.source.conferencedate16/12/2020
dc.source.conferencelocationonline online
dc.identifier.urlhttps://www.ieeesisc.org/programs/2020_SISC_technical_program.pdf
imec.availabilityPublished - imec


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