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Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide

dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorHung, Joey
dc.contributor.authorKoret, Roy
dc.contributor.authorTurovets, Igor
dc.contributor.authorShah, Kavita
dc.contributor.authorRangarajan, Srinivasan
dc.contributor.authorWarad, Laxmi
dc.contributor.authorZhang, Vanessa
dc.contributor.authorAmeloot, Rob
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-28T23:30:54Z
dc.date.available2021-10-28T23:30:54Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35415
dc.sourceIIOimport
dc.titlePlasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
dc.typeProceedings paper
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorHung, Joey
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage113250Y
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2551492
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 11325


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